TETRAMETHYL AMMONIUM HYDROXIDE 1M SOLUTION IN WATER

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TETRAMETHYL AMMONIUM HYDROXIDE 1M SOLUTION IN WATER Specification

Usage
Common in semiconductor manufacturing and organic reactions

Molecular Formula
C4H13NO

Density
0.99 Gram per cubic centimeter(g/cm3)

Molecular Weight
91.15 g/mol

Application
Used as a strong base in organic synthesis lithography and etching processes

Purity
1M concentration in water

Melting Point
Not applicable (solution)

Grade
AR (Analytical Reagent) or Semiconductor Grade

Solubility
Miscible with water

Poisonous
YES

Properties
Highly alkaline corrosive with strong hydroxide ion activity; miscible in polar solvents

CAS No
75-59-2

Ingredients
Tetramethylammonium hydroxide and deionized water

EINECS No
200-882-9

HS Code
29239000

Storage
Store in a cool dry and well-ventilated place. Keep container tightly closed

Structural Formula
CH3-N+(CH3)3-OH-

Shape
Not applicable (liquid form)

Shelf Life
Typically 12 months under recommended storage conditions

Smell
Ammonia-like

Physical Form
Liquid

Appearance
Clear colorless liquid

Taste
Bitter and slightly soapy

Ph Level
Approximately 13.5

About TETRAMETHYL AMMONIUM HYDROXIDE 1M SOLUTION IN WATER

Tetramethyl Ammonium Hydroxide 1M Solution in Water is a clear colorless liquid that serves as a powerful base in various applications such as organic synthesis, lithography, etching processes, and semiconductor manufacturing. With a highly alkaline and corrosive nature, this solution is primarily used in the semiconductor industry and for organic reactions. It has a bitter and slightly soapy taste with an ammonia-like smell. This product is stored in a cool, dry place and has a shelf life of approximately 12 months under recommended conditions. Being miscible in water, it is widely used due to its properties, including a pH level of around 13.5 and a density of 0.99 g/cm3.

FAQs of TETRAMETHYL AMMONIUM HYDROXIDE 1M SOLUTION IN WATER:

Q: What are the main applications of Tetramethyl Ammonium Hydroxide 1M Solution in Water?

A: It is commonly used as a strong base in organic synthesis, lithography, etching processes, semiconductor manufacturing, and various organic reactions.